The analysis of electroplating baths and other process samples is crucial for process stability and product quality. Complex matrices and changing metal concentrations place high demands on analytical instrumentation.

With high-performance instruments for metal and TOC analysis, Analytik Jena offers tailor-made solutions. The ICP-OES PlasmaQuant 9200 enables interference-free multi-element analysis with low detection limits thanks to its high spectral resolution. The AAS contrAA 800 F offers easy operation and fast multi-element analysis with only one lamp for all relevant elements. For reliable TOC determination in samples with high inorganic matrix load, the multi N/C 4300 UV is the instrument of choice. Its robust UV digestion technology reduces maintenance requirements and operating costs.

Personal support and automated operating concepts simplify everyday laboratory work. Visit Analytik Jena at SurfaceTechnology GERMANY in Hall 1, Stand C34 .