This is the latest model of the electron beam lithography equipment that we have been working on for many years since our founding. Adopting a module system, you can freely combine the acceleration voltage, chamber size, transfer mechanism, and anti-vibration table to build the optimum unit for each application.
It is possible to expose the entire surface of a 12 inch wafer.
By docking with the wafer automatic transfer system (EFEM), multi-stage processing by robots is possible.
Accelerating voltage can be selected from 50, 100, 125, 150 kV depending on the application.
By selecting a high-current model with a maximum current of 800 nA, high-throughput microfabrication that exceeds the common sense of electron beam lithography is possible.